JPS63123668U - - Google Patents
Info
- Publication number
- JPS63123668U JPS63123668U JP1610587U JP1610587U JPS63123668U JP S63123668 U JPS63123668 U JP S63123668U JP 1610587 U JP1610587 U JP 1610587U JP 1610587 U JP1610587 U JP 1610587U JP S63123668 U JPS63123668 U JP S63123668U
- Authority
- JP
- Japan
- Prior art keywords
- magnet
- target
- substrate holder
- thin film
- production apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 239000010409 thin film Substances 0.000 claims description 3
- BGPVFRJUHWVFKM-UHFFFAOYSA-N N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] Chemical compound N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] BGPVFRJUHWVFKM-UHFFFAOYSA-N 0.000 claims 4
- 230000005684 electric field Effects 0.000 claims 2
- 239000011261 inert gas Substances 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
- 230000003628 erosive effect Effects 0.000 description 1
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1610587U JPS63123668U (en]) | 1987-02-04 | 1987-02-04 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1610587U JPS63123668U (en]) | 1987-02-04 | 1987-02-04 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63123668U true JPS63123668U (en]) | 1988-08-11 |
Family
ID=30807660
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1610587U Pending JPS63123668U (en]) | 1987-02-04 | 1987-02-04 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63123668U (en]) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55100981A (en) * | 1979-01-24 | 1980-08-01 | Murata Mfg Co Ltd | Magnetron sputtering apparatus |
-
1987
- 1987-02-04 JP JP1610587U patent/JPS63123668U/ja active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55100981A (en) * | 1979-01-24 | 1980-08-01 | Murata Mfg Co Ltd | Magnetron sputtering apparatus |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR880009454A (ko) | 스퍼터 성막방법 및 그 장치 | |
GB594809A (en) | A method and apparatus for making pattern mirrors and other coatings | |
JPS63123668U (en]) | ||
ES393087A1 (es) | Perfeccionamientos en un aparato para la pulverizacion ca- todica. | |
JPS6254907A (ja) | スパツタ装置 | |
JPS5943546B2 (ja) | スパツタリング装置 | |
JP2008013829A (ja) | 金属酸化膜の成膜方法 | |
JP3628395B2 (ja) | スパッタカソード | |
JPS5813622B2 (ja) | マグネトロン型スパッタ装置 | |
JPS61272373A (ja) | スパツタ装置 | |
JPS6319565U (en]) | ||
JP2531052Y2 (ja) | マグネトロンスパッタ装置 | |
JPS6221065U (en]) | ||
JPS6275063U (en]) | ||
JP3996977B2 (ja) | 成膜装置およびそのターゲットの交換方法 | |
JPS6334164U (en]) | ||
JPS62193660U (en]) | ||
JP2001234337A5 (en]) | ||
JPH0242060U (en]) | ||
JPH0367061U (en]) | ||
JPH0280564A (ja) | スパッタリング装置 | |
JPH02132656U (en]) | ||
JPS6344728A (ja) | スパツタエツチング装置 | |
JPH0261062A (ja) | マグネトロンスパッタ装置 | |
JPS63143568U (en]) |